The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
Dec. 10, 2004
Hyun-ki Kim, Hwaseong-si, KR;
Joo-ho Kim, Yongin-si, KR;
In-oh Hwang, Seongnam-si, KR;
Du-seop Yoon, Seongnam-si, KR;
Hyun-ki Kim, Hwaseong-si, KR;
Joo-ho Kim, Yongin-si, KR;
In-oh Hwang, Seongnam-si, KR;
Du-seop Yoon, Seongnam-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A super resolution information storage medium capable of reproducing information recorded thereon as a mark with a size less than the resolution limit of an incident light beam, includes marks of varying sizes recorded thereon, excluding marks with a size in the vicinity of the resolution limit, where the resolution limit depends on the wavelength of a light source irradiating light on the information storage medium and the numerical aperture of an object lens focusing the light irradiated from the light source on the information storage medium. By adjusting the size of or excluding a mark with a size in the vicinity of the limit of the resolution that has a low C/N ratio, the C/N ratio is improved and the performance of super resolution information reproduction is improved such that high density and high capacity information storage medium can be implemented.