The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2009

Filed:

Aug. 18, 2005
Applicants:

Scott W. Sparrold, Vail, AZ (US);

R. Hamilton Shepard, Iii, Tucson, AZ (US);

Patrick L. Mccarthy, Tucson, AZ (US);

Richard C. Juergens, Tucson, AZ (US);

Inventors:

Scott W. Sparrold, Vail, AZ (US);

R. Hamilton Shepard, III, Tucson, AZ (US);

Patrick L. McCarthy, Tucson, AZ (US);

Richard C. Juergens, Tucson, AZ (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

The disclosed system, device and method for spatial homogenization and focusing of electromagnetic radiation over an aperture to reduce the effects of atmospheric scintillation generally includes an optical lens having an at least partially undulating pattern mapped onto a curvilinear surface. Disclosed features and specifications may be variously controlled, adapted or otherwise optionally modified to eliminate or otherwise reduce the effects of atmospheric scintillation as well as other optical aberrations. Exemplary embodiments of the present invention generally provide improved systems and methods for the acquisition, tracking and engagement of military targets with missiles or other guided ordinance.


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