The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
Aug. 04, 2005
Hiroyuki Tokunaga, Fujisawa, JP;
Hiroyuki Tokunaga, Fujisawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of manufacturing a liquid discharge head, which includes a pressure generating chamber, a discharge port, and a piezoelectric element formed of a pair of electrode films sandwiching a piezoelectric material film, includes steps of preparing a structure with a single crystal Si layer accumulated above a front surface of an Si substrate through an etching stop layer; forming a buffer layer on the single crystal Si layer; forming, above the buffer layer, the piezoelectric material film which is directed in a preferential orientation to a direction of the polarization through one of the pair of electrode films; forming the pressure generating chamber on the piezoelectric material film; and etching a location corresponding to the piezoelectric material film of the Si substrate from a rear surface of the Si substrate to reach the etching stop layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile