The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
May. 07, 2003
Satyendra Kumar, Troy, MI (US);
Devendra Kumar, Rochester Hills, MI (US);
Satyendra Kumar, Troy, MI (US);
Devendra Kumar, Rochester Hills, MI (US);
BTU International, Inc., N. Billerica, MA (US);
Abstract
Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma () forms in the cavity (). A filter () capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity (). In this way, the selected species can be extracted and collected, for storage or immediate use.