The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2009

Filed:

Dec. 11, 2003
Applicants:

Machial Goedhart, Olivier van Noortlaan, NL;

Joel Luckman, Benton Harbor, MI (US);

Hank Robert Reinhoudt, Olivier van Noortlaan, NL;

Jan Hendrik Verbeek, Olivier van Noortlaan, NL;

Vicki Lyn Wyatt-smith, Watervliet, MI (US);

Brian W. May, St. Joseph, MI (US);

Mark B. Kovich, St. Joseph, MI (US);

Tremitchell Wright, Elkhart, IN (US);

Daniel C. Conrad, Stevensville, MI (US);

Inventors:

Machial Goedhart, Olivier van Noortlaan, NL;

Joel Luckman, Benton Harbor, MI (US);

Hank Robert Reinhoudt, Olivier van Noortlaan, NL;

Jan Hendrik Verbeek, Olivier van Noortlaan, NL;

Vicki Lyn Wyatt-Smith, Watervliet, MI (US);

Brian W. May, St. Joseph, MI (US);

Mark B. Kovich, St. Joseph, MI (US);

Tremitchell Wright, Elkhart, IN (US);

Daniel C. Conrad, Stevensville, MI (US);

Assignee:

Whirlpool Corporation, Benton Harbor, MI (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 3/00 (2006.01); D06L 1/04 (2006.01); A01H 5/02 (2006.01); A01H 5/00 (2006.01); D06F 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved solvent cleaning process of cleaning a non-aqueous solvent used in a dry cleaning process for fabrics including consecutive wash cycles for washing respective fabrics batches, including a basic solvent refining cycle and a first advanced solvent refining cycle, the basic solvent refining cycle including a step of separating solvent into a first solvent fraction and a second solvent fraction which is less clean than the first fraction, wherein the basic and first advanced solvent refining cycles are independently effected when solvent to be cleaned fulfils a respective predetermined condition.


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