The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2009

Filed:

Dec. 08, 2005
Applicants:

Xavier Levecq, Gif sur Yvette, FR;

Sylvain Chene, Charenton-le-Pont, FR;

Inventors:

Xavier Levecq, Gif sur Yvette, FR;

Sylvain Chene, Charenton-le-Pont, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/00 (2006.01); G01J 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method and to apparatus for contactlessly measuring the curvature of an ophthalmic article () having a 'front' face (B) that presents said curvature. The method consists in: sequentially emitting at least two light beams (L, L) onto said front face, these two light beams being offset by a certain angle (α) and converging substantially onto said front face, one of said emitted light beams (L) being substantially centered on said front face and being substantially normal to said front face; analyzing the wave fronts of the resulting reflected beams (L', L′) in order to determine their respective focuses (F, F) therefrom; and deducing the radius of curvature of said face; said operations being performed in such a manner that said emitted beams are substantially not reflected by the rear face of said article.


Find Patent Forward Citations

Loading…