The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2009

Filed:

Aug. 31, 2007
Applicants:

Bishnu Prasanna Gogoi, Scottsdale, AZ (US);

Navid Yazdi, Ann Arbor, MI (US);

Inventors:

Bishnu Prasanna Gogoi, Scottsdale, AZ (US);

Navid Yazdi, Ann Arbor, MI (US);

Assignee:

Evigia Systems, Inc., Ann Arbor, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H02N 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.


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