The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
May. 07, 2003
Applicants:
Satyendra Kumar, Troy, MI (US);
Devendra Kumar, Rochester Hills, MI (US);
Inventors:
Satyendra Kumar, Troy, MI (US);
Devendra Kumar, Rochester Hills, MI (US);
Assignee:
BTU International, Inc., N. Billerica, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/26 (2006.01); H01L 21/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various doping processes. In one embodiment, a substrate () can be doped by forming a plasma () in a cavity () by subjecting a gas to an amount of electromagnetic radiation in the presence of a plasma catalyst () and adding at least one dopant material to the plasma. The material is then allowed to penetrate into the substrate. Various active and passive catalysts are provided.