The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Sep. 11, 2007
Hyo-jin Yun, Anyang-si, KR;
Young-gil Kwon, Yongin-si, KR;
Young-ho Kim, Yongin-si, KR;
Hong Lee, Suwon-si, KR;
Do-young Kim, Seoul, KR;
Hyo-Jin Yun, Anyang-si, KR;
Young-Gil Kwon, Yongin-si, KR;
Young-Ho Kim, Yongin-si, KR;
Hong Lee, Suwon-si, KR;
Do-Young Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a cyclodextrin derivative, about 0.1 percent to about 0.5 percent by weight of a photoacid generator, and a remainder of an organic solvent. The cyclodextrin derivative includes a β-cyclodextrin moiety and at least one alkyl carbonate group.