The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2009

Filed:

Jul. 01, 2005
Applicants:

Sadayuki Watanabe, Nagano, JP;

Yasushi Sakai, Nagano, JP;

Inventors:

Sadayuki Watanabe, Nagano, JP;

Yasushi Sakai, Nagano, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/64 (2006.01); G11B 5/738 (2006.01); B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A perpendicular medium is disclosed in which an isolation structure of an underlayer is formed using a simple method as in a conventional manufacturing process for a medium of continuous films. The method suppresses dispersion of alignment and reduced magnetic cluster size in a magnetic recording layer. The perpendicular medium exhibits high recording density owing to thin film thickness of the underlayer. A perpendicular magnetic recording medium includes at least an underlayer and a magnetic recording layer sequentially laminated on a nonmagnetic substrate. The underlayer consists of crystal grains and an amorphous grain boundary, and the crystal grain has a shape holding a relation (an area of a bottom region at an initial stage of growth)>(an area of a top region).


Find Patent Forward Citations

Loading…