The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Jan. 26, 2004
Applicants:
Phillip A. Himmer, Bozeman, MT (US);
David L. Dickensheets, Bozeman, MT (US);
Inventors:
Phillip A. Himmer, Bozeman, MT (US);
David L. Dickensheets, Bozeman, MT (US);
Assignee:
Montana State University, Bozeman, MT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical element with multi-layer composites that deforms to reduce optical aberrations in off-axis optic. Methods are also described in relation to the optical element.
Himmer, Phillip. (2009). Off-axis variable focus and aberration control mirrors and method (U.S. Patent No. 7494233). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7494233
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile