The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Dec. 16, 2004
Pingfan Wu, Niskayuna, NY (US);
George Dalakos, Niskayuna, NY (US);
Brian Lawrence, Clifton Park, NY (US);
Peter Lorraine, Niskayuna, NY (US);
William Taylor Yenisch, Longwood, FL (US);
Pingfan Wu, Niskayuna, NY (US);
George Dalakos, Niskayuna, NY (US);
Brian Lawrence, Clifton Park, NY (US);
Peter Lorraine, Niskayuna, NY (US);
William Taylor Yenisch, Longwood, FL (US);
Lockheed Martin Corporation, Bethesda, MD (US);
Abstract
Method for limiting amount of radiation impinging on a radiation-sensitive detector device by directing radiation toward the detector, permitting the radiation to impinge upon the detector device when the radiation is below a predetermined threshold, and utilizing radiation having wavelengths different from signals of interest to initiate limiting of the radiation impinging upon the detector when the predetermined threshold is exceeded. The optical limiter includes an IR limiting layer pair selected so that energy from visible and near infrared radiation activates the optical limiter. The limiting layer pair may includes a layer closer to the source of radiation of e.g. vanadium dioxide, vanadium sesquioxide, or germanium crystal and a layer further from the source of radiation of e.g. chalcogenide glass, germanium crystal, or sodium chloride crystal.