The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Feb. 21, 2006
Noriaki Okazawa, Nagano, JP;
Nobuhiko Yamauchi, Nagano, JP;
Sumio Arai, Nagano, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A method of producing a liquid ejection head comprising: a flow path forming substrate in which a space including pressure generating chambers and an ink reserving chamber is formed; a nozzle plate which is stacked on one face of the flow path forming substrate; and a vibration plate which is stacked on the other face of the flow path forming substrate is provided. The flow path forming substrate is formed by a monocrystal silicon substrate in which a plane of crystal plane orientation of () is the surface. When the ink reserving chamber penetrating from the one face of the substrate to the other face is formed by anisotropically etching the () plane of the flow path forming substrate, a () plane which is inclined with respect to the () plane is caused to appear, whereby a step portion which extends in the plate face direction of the substrate, and in which an inner wall face of the flow path forming substrate on the side of the nozzle plate is inward projected is formed on an inner wall face of the ink reserving chamber.