The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2009

Filed:

Feb. 12, 2007
Applicants:

Stefanovich Genrikh, Yongin-si, KR;

Choong-rae Cho, Yongin-si, KR;

Eun-hong Lee, Yongin-si, KR;

Inventors:

Stefanovich Genrikh, Yongin-si, KR;

Choong-Rae Cho, Yongin-si, KR;

Eun-Hong Lee, Yongin-si, KR;

Assignee:

Samsung Electronics Co., Ltd, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/80 (2006.01);
U.S. Cl.
CPC ...
Abstract

Example embodiments are directed to a junction field effect thin film transistor (JFETFT) including a first electrode formed on a substrate, a first conductive first gate semiconductor pattern formed on the first gate electrode, a second conductive semiconductor channel layer formed on the substrate and the first conductive first gate semiconductor pattern, and source and drain electrodes formed on the second conductive semiconductor pattern and located at both sides of the first conductive gate semiconductor pattern. The JFETFT may further include a first conductive second gate semiconductor pattern formed on a portion of the second conductive semiconductor channel layer between the source electrode and the drain electrode, and a second gate electrode formed on the first conductive second gate semiconductor pattern.


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