The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
May. 05, 2005
Flavio Noca, Altadena, CA (US);
Elijah B. Sansom, Pasadena, CA (US);
Jijie Zhou, Singapore, SG;
Morteza Gharib, San Marino, CA (US);
Flavio Noca, Altadena, CA (US);
Elijah B. Sansom, Pasadena, CA (US);
Jijie Zhou, Singapore, SG;
Morteza Gharib, San Marino, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
A method of assembling large numbers of nanoscale structures in pre-determined ways using fluids or capillary lithography to control the patterning and arrangement of the individual nanoscale objects and nanostructures formed in accordance with the inventive method are provided. In summary, the current method uses the controlled dispersion and evaporation of fluids to form controlled patterns of nanoscale objects or features anchored on a substrate, such as nanoscale fibers like carbon nanotubes.