The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Oct. 10, 2007
Hyo-jin Yun, Anyang-si, KR;
Young-gil Kwon, Yongin-si, KR;
Do-young Kim, Gwanak-gu, KR;
Jae-ho Kim, Yongin-si, KR;
Young-ho Kim, Yongin-si, KR;
Boo-deuk Kim, Yeongtong-gu, KR;
Hyo-Jin Yun, Anyang-si, KR;
Young-Gil Kwon, Yongin-si, KR;
Do-Young Kim, Gwanak-gu, KR;
Jae-Ho Kim, Yongin-si, KR;
Young-Ho Kim, Yongin-si, KR;
Boo-Deuk Kim, Yeongtong-gu, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a positively charged sulfonium ion and a negatively charged sulfonate ion having a hydrophilic carboxylic group, about 4 to about 10 percent by weight of a resin, and a solvent.