The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Feb. 23, 2004
Applicant:
Daisuke Adachi, Kyoto, JP;
Inventor:
Daisuke Adachi, Kyoto, JP;
Assignee:
Panasonic Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 17/49 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a method of manufacturing a PDP that prevents a defect from occurring in a structure of the PDP; and also suppresses retroflexion, exfoliation, and the like, of the structure. In photolithography, exposure is performed twice with a first and a second photomasks, each having a different aperture width, but the same exposure pattern. The amount of exposure is different between first exposure region (A') through the first photomask; and second exposure region (B′) through the second photomask.