The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7488671 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 10, 2009

Filed:

May. 26, 2006
Applicants:

Reed Roeder Corderman, Niskayuna, NY (US);

Anthony Yu-chung Ku, Rexford, NY (US);

Inventors:

Reed Roeder Corderman, Niskayuna, NY (US);

Anthony Yu-Chung Ku, Rexford, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 21/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making a nanostructure array including disposing a masking material on a nanoporous template such that a first number of the plurality of nanopores are fully coated while a second number of the plurality of nanopores are not-fully coated by the masking material is provided. The method includes forming the nanostructures within the plurality of nanopores that are not-fully coated by the masking material. A nanostructure array fabricated in accordance to above said method and devices based on the nanostructure array is also provided.


Find Patent Forward Citations

Loading…