The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2009
Filed:
May. 03, 2006
Applicants:
Moo-yong Park, Gyeonggi-do, KR;
Sang-rok Hah, Seoul, KR;
Jong-gyoon Kim, Gyeonggi-do, KR;
Hong-seong Son, Gyeonggi-do, KR;
Ja-hyung Han, Gyeonggi-do, KR;
Inventors:
Moo-Yong Park, Gyeonggi-do, KR;
Sang-Rok Hah, Seoul, KR;
Jong-Gyoon Kim, Gyeonggi-do, KR;
Hong-Seong Son, Gyeonggi-do, KR;
Ja-Hyung Han, Gyeonggi-do, KR;
Assignee:
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Polishing apparatus and related methods employ aligned first and second magnetic field sources to adjust the compressive force and/or pressure applied by a carrier head against a target workpiece (such as a wafer) by selectively and controllably generating a repellant or attractive force between the two magnetic field sources.