The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Dec. 02, 2005
Chien-chih Lai, Hsinchu, TW;
Chin-ming Chung, Hsinchu, TW;
Juin-hong Lin, Hsinchu, TW;
Pi-tsung Hsu, Hsinchu, TW;
Chiih-wei Tso, Hsinchu, TW;
Chien-Chih Lai, Hsinchu, TW;
Chin-Ming Chung, Hsinchu, TW;
Juin-Hong Lin, Hsinchu, TW;
Pi-Tsung Hsu, Hsinchu, TW;
Chiih-Wei Tso, Hsinchu, TW;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A fabrication method for hollow integration rod suitable for high temperature operation, comprising the steps: (a) pre-fixing a set of mirrors to be a hollow integration rod by a light curable adhesive (such as UV curable adhesive); and (b) fixing those mirrors permanently by an inorganic adhesive. Wherein the mirrors can be a High Reflective Mirror with dielectric thin films, or it could be a High Reflective Mirror made of metallic thin film and coating a dielectric thin films by deposition for enhancing the reflection and protection purpose; for a all dielectric film, since there are multi-layer of thin dielectric films been deposited thereon, to prevent the warpage or distortion due to film stress in deposition process, several layers of thin film of silicon oxide SiOx can be pre-deposited on the backside of the mirror to balance.