The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Feb. 28, 2006
Applicants:
Albrecht Weiss, Linden, DE;
Michael Ganzer, Giessen, DE;
Inventors:
Albrecht Weiss, Linden, DE;
Michael Ganzer, Giessen, DE;
Assignee:
Leica Microsystems CMS GmbH, Wetzlar, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/06 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An objective for total internal reflection microscopy includes a diaphragm disposed near to or in the plane of the objective pupil. The diaphragm includes a middle area impermeable to illumination light and permeable to detection light of a microscope, and includes an edge area permeable to the illumination light. The illumination light has a focus in the plane of the objective pupil.