The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Feb. 04, 2008
Thomas A. Reichardt, Livermore, CA (US);
Amy Khai Luong, Dublin, CA (US);
Thomas J. Kulp, Livermore, CA (US);
Sanjay Devdas, Albany, CA (US);
Thomas A. Reichardt, Livermore, CA (US);
Amy Khai Luong, Dublin, CA (US);
Thomas J. Kulp, Livermore, CA (US);
Sanjay Devdas, Albany, CA (US);
Sandia Corporation, Livermore, CA (US);
Abstract
A system is described that is suitable for use in determining the location of leaks of gases having a background concentration. The system is a point-wise backscatter absorption gas measurement system that measures absorption and distance to each point of an image. The absorption measurement provides an indication of the total amount of a gas of interest, and the distance provides an estimate of the background concentration of gas. The distance is measured from the time-of-flight of laser pulse that is generated along with the absorption measurement light. The measurements are formatted into an image of the presence of gas in excess of the background. Alternatively, an image of the scene is superimposed on the image of the gas to aid in locating leaks. By further modeling excess gas as a plume having a known concentration profile, the present system provides an estimate of the maximum concentration of the gas of interest.