The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Sep. 13, 2006
Xiaoming Chen, Austin, TX (US);
Maihan Nguyen, Austin, TX (US);
Osamu Arasaki, Austin, TX (US);
Tammy Maraquin, Austin, TX (US);
Daniel Sawyer, Pflugerville, TX (US);
Pedro Morrison, Austin, TX (US);
Xiaoming Chen, Austin, TX (US);
Maihan Nguyen, Austin, TX (US);
Osamu Arasaki, Austin, TX (US);
Tammy Maraquin, Austin, TX (US);
Daniel Sawyer, Pflugerville, TX (US);
Pedro Morrison, Austin, TX (US);
Samsung Austin Semiconductor, L.P., Austin, TX (US);
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and cleaning the semiconductor reticle. Also included is a haze forecasting method for haze control on a semiconductor reticle, including scanning a plurality of semiconductor wafers, identifying repeating defects in the semiconductor wafers, storing the repeating defects in a database as known repeating defects, and identifying an additional repeating defect that is not a known repeating defect, the additional repeating defect caused by semiconductor reticle haze.