The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Jun. 16, 2006
Applicant:
Shun-tai Huang, Tainan County, TW;
Inventor:
Shun-Tai Huang, Tainan County, TW;
Assignee:
Himax Display, Inc., Tainan County, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/08 (2006.01); G02B 5/10 (2006.01); G02B 7/182 (2006.01);
U.S. Cl.
CPC ...
Abstract
A manufacturing process for enhancing a light reflective rate in a reflective type display device is provided. The manufacturing process comprises steps of: forming a first conductive layer and a first dielectric layer over a substrate; etching the first dielectric layer; polishing the etched first dielectric layer; forming a second conductive layer over the substrate; and patterning the second conductive layer to form a concave mirror on the surface of the second conductive layer.
Huang, Shun-Tai. (2009). Manufacturing process for enhancing light reflection rate in a reflective display device (U.S. Patent No. 7486358). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7486358
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile