The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Oct. 08, 2004
Applicants:
Takashi Masuda, Suwa, JP;
Masayoshi Todorokihara, Fujimi-machi, JP;
Inventors:
Takashi Masuda, Suwa, JP;
Masayoshi Todorokihara, Fujimi-machi, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is a method for forming a film by which a highly accurate film pattern can easily be formed out of droplets. The method includes forming linear droplets on a surface of a substrate, providing a temperature gradient onto surfaces of the linear droplets, and forming a dry film including a straight part at an end section of the linear droplets. In order to provide a temperature gradient onto surfaces of the linear droplets, the substrate, on which the droplet is sprayed, is bridged between a hot plate and cooling plate.