The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2009

Filed:

Feb. 13, 2006
Applicants:

Peter Gefter, So. San Francisco, CA (US);

Scott Gehlke, Berkeley, CA (US);

John K. O'reilly, San Francisco, CA (US);

Inventors:

Peter Gefter, So. San Francisco, CA (US);

Scott Gehlke, Berkeley, CA (US);

John K. O'Reilly, San Francisco, CA (US);

Assignee:

Ion Systems, Alameda, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01H 50/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Ions for neutralizing electrostatic charge on an object are generated and delivered in a stream of gas flowing through a dielectric channel that surrounds a loop of conductive filament which forms an ionizing electrode. The loop is formed within a single plane, or within multiple planes, and is supported within the channel with a plane of the loop substantially aligned with flow of gas through the channel. A region of minimum field intensity within the bounded region of the loop electrode is oriented in alignment with substantially maximum velocity of gas flow through a cross section of the dielectric channel.


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