The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2009
Filed:
Jun. 23, 2004
Igor Volfman, Sunnyvale, CA (US);
Andrew Huibers, Palo Alto, CA (US);
Satyadev Patel, Sunnyvale, CA (US);
Peter Richards, San Francisco, CA (US);
Leonid Frenkel, Palo Alto, CA (US);
Jim Dunphy, San Jose, CA (US);
Regis Grasser, Mountain View, CA (US);
Greg Schaadt, Santa Clara, CA (US);
Igor Volfman, Sunnyvale, CA (US);
Andrew Huibers, Palo Alto, CA (US);
Satyadev Patel, Sunnyvale, CA (US);
Peter Richards, San Francisco, CA (US);
Leonid Frenkel, Palo Alto, CA (US);
Jim Dunphy, San Jose, CA (US);
Regis Grasser, Mountain View, CA (US);
Greg Schaadt, Santa Clara, CA (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.