The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2009
Filed:
Jun. 29, 2005
Gerhard Kunkel, Radebeul, DE;
Gerhard Kunkel, Radebeul, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The invention relates to a method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer. An exposure device () is provided, which can emit light in two polarization planes (). Through the choice of the degree of polarization, i.e., the ratio of the intensity in the first polarization plane () to the intensity in the second polarization plane (), it is possible to alter the ratio of width () to length () of the resist structure () formed on the resist layer (). A variation of approximately 30% with respect to dimensionally accurate imaging can thus be achieved in a simple manner.