The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2009

Filed:

Mar. 14, 2005
Applicant:

Kenji Sato, Higashine, JP;

Inventor:

Kenji Sato, Higashine, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polycrystalline structure film has a seed layer extending over the surface of an object. The seed layer includes crystal grains growing in the orthogonal direction perpendicular to the surface of the object. A crystalline layer extends on the surface of the seed layer. The crystal grains have normals perpendicular to lattice surfaces preferentially oriented in a predetermined direction. The normals are inclined relative to the orthogonal direction. The polycrystalline structure film allows the growth of the crystal grains in the orthogonal direction perpendicular in the seed layer. The lattice surfaces are inclined relative to the orthogonal direction in the crystal grains in the seed layer. The characteristic of the crystalline layer can be controlled under the influence of the crystal grains in the seed layer.


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