The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2009
Filed:
Nov. 07, 2001
Eiji Matsukawa, Yotsukaido, JP;
Eiji Matsukawa, Yotsukaido, JP;
Nikon Corporation, Tokyo, JP;
Abstract
During the polishing of a wafer, the waferis illuminated with measuring light emitted from a light source, and the spectroscopic intensity of the reflected light is detected by a linear sensor. The signal processing partmonitors the polishing state of the waferon the basis of detection signals from the sensor, and detects the polishing endpoint of the wafer. The shutter mechanism control partcontrols the motorof the shutter mechanismin response to the polishing endpoint detection signal from the signal processing part, and causes a light blocking memberto advance into the light path of the measuring light, so that the measuring light is blocked with respect to the wafer. As a result, the effect of the measuring light used for the monitoring of the polishing state on the object of polishing can be reduced.