The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
Sep. 07, 2005
Karl Brown, Mountain View, CA (US);
Semyon Sherstinsky, San Francisco, CA (US);
Wei W. Wang, Santa Clara, CA (US);
Cheng-hsiung Tsai, Cupertino, CA (US);
Vineet Mehta, Sunnyvale, CA (US);
Allen Lau, Cupertino, CA (US);
Steve Sansoni, Livermore, CA (US);
Karl Brown, Mountain View, CA (US);
Semyon Sherstinsky, San Francisco, CA (US);
Wei W. Wang, Santa Clara, CA (US);
Cheng-Hsiung Tsai, Cupertino, CA (US);
Vineet Mehta, Sunnyvale, CA (US);
Allen Lau, Cupertino, CA (US);
Steve Sansoni, Livermore, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.