The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
Sep. 01, 2004
Philippe Cormont, Le Bouscat, FR;
Pierre-yves Thro, Gif-sur-Yvette, FR;
Charlie Vacher, Paris, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radiation is comprised of N successive current impulses whose surface energy is measured. In particular, each laser emits a quantum of energy having a given duration at each outset. The surface energy of the radiation received by the object in the course of the last N−1 pulses is thus added up for an niteration of an iterative method. The photosensitive object is displaced from a distance equal to a fraction 1/N of the width of the irradiation window according to the axis of said translation. The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method. The remaining amount of energy to be provided in order to achieve the total amount of energy and from there, the remaining pulse quanta number to be produced for an npulse is determined by selecting more particularly the corresponding number of laser sources to be turned on. The lasers thus selected are then triggered in order to deliver a pulse.