The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2009

Filed:

Jul. 10, 2001
Applicant:

Charles N. Archie, Granite Springs, NY (US);

Inventor:

Charles N. Archie, Granite Springs, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of producing an accurate critical dimension measurement comprises navigating to a critical dimension structure, performing a scanning electron microscope focusing, performing a final location alignment, acquiring waveform data, analyzing the data to determine an approximate critical dimension, analyzing the data to determine a stepper focus parameter, combining the stepper focus parameter with the critical dimension to generate an accurate critical dimension value, and reporting the same.


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