The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
May. 17, 2006
Chul Soo Byun, Seoul, KR;
Chul Soo Byun, Seoul, KR;
Piezonica Co., Ltd., Ibjang-Myon, Cheonan-Si, Chungnam, KR;
Abstract
Disclosed is a method of chemical vapor deposition (CVD). The method provides for use of a showerhead through which a source material gas including a reactive gas of at least one kind and a purge gas is injected over a substrate located in a reaction chamber to deposit a film on the substrate. The showerhead has reactive gas outlets surrounded by purge gas outlets. The bottom surface of the showerhead is spaced apart from the substrate by a predetermined distance. Reactive gases of different kinds are injected into compartments formed inside the showerhead so that each compartment of the showerhead is filled with the reactive gas of only one kind, and a purge gas of the source material gas is supplied into another compartment formed inside the showerhead. The reactive gas and the purge gas are discharged through the reactive gas outlets and purge gas outlets. Preferably, there are more purge gas outlets than reactive gas outlets.