The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Mar. 01, 2005
Applicants:
Jian Wang, Beijing, CN;
Liyon Chen, Beijing, CN;
Yihua Xu, Beijing, CN;
Yingnong Dang, Beijing, CN;
Zhouchen Lin, Beijing, CN;
Inventors:
Jian Wang, Beijing, CN;
Liyon Chen, Beijing, CN;
Yihua Xu, Beijing, CN;
Yingnong Dang, Beijing, CN;
Zhouchen Lin, Beijing, CN;
Assignee:
Microsoft Corporation, Redmond, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01); G06K 9/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for performing EIC pattern analysis is described. Pattern feature extraction is performed followed by EIC symbol segmentation. A system may later use the result from the pattern analysis to determine a location of a captured image in relation to a larger array of EIC symbols.