The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2009

Filed:

May. 24, 2006
Applicants:

Martin M. Liphardt, Lincoln, NE (US);

James D. Welch, Omaha, NE (US);

Corey L. Bungay, Lincoln, NE (US);

John A. Woollam, Lincoln, NE (US);

Inventors:

Martin M. Liphardt, Lincoln, NE (US);

James D. Welch, Omaha, NE (US);

Corey L. Bungay, Lincoln, NE (US);

John A. Woollam, Lincoln, NE (US);

Assignee:

J.A. Woollam Co., Inc., Lincoln, NE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.


Find Patent Forward Citations

Quick Actions:

Liphardt, Martin. (2009). Sample masking in ellipsometer and the like systems including detection of substrate backside reflections (U.S. Patent No. 7477388). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7477388

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…