The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2009

Filed:

Nov. 05, 2004
Applicants:

Hidehiko Iinuma, Shibukawa, JP;

Masatomo Hayashi, Shibukawa, JP;

Natsuki Matsuura, Shibukawa, JP;

Yukinari Oguma, Shibukawa, JP;

Inventors:

Hidehiko Iinuma, Shibukawa, JP;

Masatomo Hayashi, Shibukawa, JP;

Natsuki Matsuura, Shibukawa, JP;

Yukinari Oguma, Shibukawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 9/107 (2006.01); C04B 35/40 (2006.01); H01F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention provides an Mg-based ferrite having a high dielectric breakdown voltage and a saturation magnetization suitable for electrophotographic development, a carrier containing the ferrite, and an electrophotographic developer containing the carrier. The Mg-based ferrite material of this invention comprises Li, Na, K, Rb, Cs, Ca, Sr, Ba, Y, La, Ti, Zr, Hf, V, Nb, Ta, Al, Ga, Si, Ge, P, Sb, Bi or a combination thereof. The Mg-based ferrite material has a saturation magnetization of 30 to 80 emu/g, and a dielectric breakdown voltage of 1.5 to 5.0 kV. The Mg-based ferrite material can realize high image quality, and be in compliance with environmental regulations.


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