The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Jan. 25, 2007
James W. Rudolph, Colorado Springs, CO (US);
David E. Daws, San Pedro, CA (US);
Dary Zeigler, Sun City, CA (US);
Afshin Bazshushtari, Rolling Hills Estates, CA (US);
James W. Rudolph, Colorado Springs, CO (US);
David E. Daws, San Pedro, CA (US);
Dary Zeigler, Sun City, CA (US);
Afshin Bazshushtari, Rolling Hills Estates, CA (US);
Goodrich Corporation, Charlotte, NC (US);
Abstract
A method of chemical vapor infiltration and deposition includes stacking a number of porous structures in a stack in a furnace. The stack has a center opening region extending through the porous structures and an outer region extending along the porous structures. A first portion of a reactant gas is introduced to the center opening region. A second portion of the reactant gas is introduced to the outer region. The first portion and the second portion are controlled proportions thereby introducing predetermined portions of the reactant gas to both the center opening region and the outer region. The change in weight of the entire furnace, including contents, is measured during the chemical vapor infiltration and deposition process. The rate of weight change is monitored.