The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2009

Filed:

Apr. 08, 2002
Applicants:

Yasushi Shioya, Toyama, JP;

Masanori Yatsuda, Toyama, JP;

Minoru Takachi, Toyama, JP;

Hiroshi Wada, Tokyo, JP;

Inventors:

Yasushi Shioya, Toyama, JP;

Masanori Yatsuda, Toyama, JP;

Minoru Takachi, Toyama, JP;

Hiroshi Wada, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/00 (2006.01); C01B 21/00 (2006.01); C01G 28/00 (2006.01); B01J 23/00 (2006.01); B01J 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a treating agent for a metal hydride-containing exhaust gas, wherein the treating agent is low in exothermic property and further high in performance in a treatment of harm-elimination for the metal hydride-containing exhaust gas, comprises at least one among metal hydroxide, metal carbonate, basic metal carbonate, and further supports at least one metal among group-VIII noble metals on periodic table and silver. Therefore, the performance of harm-elimination for the metal hydride-containing exhaust gas is prominently improved. The treating agent in the present invention is high in performance and further low in exothermic property, thereby that is useful in the treatment for the metal hydride-containing exhaust gas generated in semiconductor manufacturing industry and the like.


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