The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2009

Filed:

Sep. 28, 2005
Applicants:

Motoyuki Tanaka, Kanagawa-ken, JP;

Shigeru Nakamura, Kanagawa-ken, JP;

Kiyoteru Miyake, Kanagawa-ken, JP;

Inventors:

Motoyuki Tanaka, Kanagawa-ken, JP;

Shigeru Nakamura, Kanagawa-ken, JP;

Kiyoteru Miyake, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); B22F 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photo-conductor layer for constituting a radiation imaging panel, which photo-conductor layer is capable of recording radiation image information as an electrostatic latent image, is produced. The photo-conductor layer contains a BiMOsintered material, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti. Sintering processing for the formation of the BiMOsintered material is performed in an inert gas, atmosphere. Alternatively, the sintering processing is performed at a sintering temperature falling within the range of 800° C. to 900° C. and in an atmosphere, in which an oxygen partial pressure P(Pa) satisfies the condition 10≦P≦10.


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