The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Sep. 27, 2002
Jürgen Weichart, Fürstentum, LI;
Dominik Wimo Amman, Fürstentum, LI;
Siegfried Krassnitzer, Feldkirch, AT;
Jürgen Weichart, Fürstentum, LI;
Dominik Wimo Amman, Fürstentum, LI;
Siegfried Krassnitzer, Feldkirch, AT;
Oc Oerlikon Balzers AG, Furstentum, LI;
Abstract
The present invention concerns a procedure for the production of a plasma that is at least co-produced in the vacuum chamber () of a vacuum recipient () of a device suitable for plasma processing with at least one induction coil () carrying an alternating current, where the gas used to produce the plasma is fed into the vacuum chamber () through at least one inlet () and the vacuum chamber () is subject to the pumping action of at least one pump arrangement (), and where a possibly pulsed direct current is also applied to the induction coil () in order to influence the plasma density.