The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Mar. 14, 2006
Charles C. Campbell, Berkeley, CA (US);
Seema Somani, Milpitas, CA (US);
Charles C. Campbell, Berkeley, CA (US);
Seema Somani, Milpitas, CA (US);
AMO Manufacturing USA, LLC, Santa Clara, CA (US);
Abstract
Devices, systems, and methods often by measuring characterize optical structures and systems, the standard refractive error and irregular aberrations. A retinal spot can propagate through optical tissues of an eye and can be directed to refractive correction optics for correcting standard refractive errors. The corrected image is then directed to wavefront analysis optics, which form a coarse pitch lenslet array pattern and a fine pitch lenslet array pattern. The coarse pitch pattern indicates the standard refractive error of the eye, and can be used to adjust the refractive correction optics. The fine pitch pattern is formed with the corrected retinal image, facilitating precise wavefront reconstruction, measurement of high order aberrations, and the like. The coarse pitch pattern and fine pitch pattern may be formed sequentially or simultaneously.