The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Mar. 14, 2007
Applicants:
Russell W. Gruhlke, Fort Collins, CO (US);
William Richard Trutna, Jr., Atherton, CA (US);
Inventors:
Russell W. Gruhlke, Fort Collins, CO (US);
William Richard Trutna, Jr., Atherton, CA (US);
Assignee:
Avago Technologies ECBU IP (Singapore) Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/13 (2006.01); G09G 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus and method for modifying the spread of a laser beam. The apparatus comprises a laser source operable to generate a laser beam having a flux that exceeds a predetermined value and an optical train operable to modify the beam such that the flux of the beam through a predetermined aperture does not exceed the predetermined value. The optical train may include a focusing lens, a diffractive focusing vortex lens, a beam splitting device, or a two-dimensional diffraction grating.