The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Apr. 11, 2007
Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
Euclid E. Moon, Boston, MA (US);
Euclid E. Moon, Boston, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
An interferometric-spatial-phase imaging (ISPI) system includes an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate. A gap detection mechanism measures tip height above a substrate and controls tip approach toward the substrate of one or more tips, as well as measures tip deflection during surface contact of the one or more tips. A plurality of complementary marks is provided for attachment to the one or more tips. A plurality of grating marks is provided to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.