The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Nov. 26, 2003
Hideya Kumomi, Yokohama, JP;
Takeo Yamazaki, Yokohama, JP;
Masatoshi Watanabe, Tsehara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for producing a crystalline film by melting and resolidifying a film, characterized in preparing a film having a specific region and obtained either by (A) a step of forming a film in which a 'specific region' and an 'region continuous to a periphery of the specific region and different in thickness from the specific region' co-exist, or by (B) a step of irradiating a film with an elecrtromagnetic wave or particles having a mass in mutually different conditions between a specific region and a peripheral region thereof, and melting and resolidifying at least a part of the film. As the spatial position of the specific region can be exactly and easily controlled, it is possible to obtain a crystalline film in which a crystal grain is formed in a desired position.