The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2008

Filed:

Jul. 14, 2006
Applicants:

Hung-chang Chang, Kaohsiung, TW;

Yaomin Lin, Hsinchu, TW;

Inventors:

Hung-Chang Chang, Kaohsiung, TW;

Yaomin Lin, Hsinchu, TW;

Assignee:

Chroma Ate Inc., Taoyuan Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A surface profile measuring method using a broad bandwidth light source illuminating a sample surface and a reference surface through a splitter is provided. By changing a distance between the sample surface and the reference surface with a constant step, an interference diagram with a waveform composed of interference data points depicting a relationship of surface height versus illumination intensity is generated. In the beginning, a first data point with greatest illumination intensity is selected from the interference data points on the waveform. Then, a second data point is selected from the data points on the waveform within a predetermined range centered at the first data point to have the waveform showing best quality of symmetry. Then, a peak of a fringe defined by the second data point and its neighboring data points is estimated by using phase compensating approach.


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