The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7471398 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 30, 2008

Filed:

Sep. 12, 2003
Applicants:

Ian Saunders, Amsterdam, NL;

Jacobus Johannes Korpershoek, Schiedam, NL;

Hedser Van Brug, The Hague, NL;

Inventors:

Ian Saunders, Amsterdam, NL;

Jacobus Johannes Korpershoek, Schiedam, NL;

Hedser van Brug, The Hague, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for measuring a contour variation of a measuring area on an object. The method includes the steps of: irradiating the measuring area with a light beam, wherein reflection or transmission of the beam occurs; splitting the transmitted or reflected beam; combining the split beams with each other and observing a fringe pattern representing a differential phase between the split beams; varying the phase of the split beams relative to each other, such that the differential phase is kept within the range of 2 pi; calculating an optical path length difference from the differential phase; and relating the optical path length difference to the contour variation of the object.


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