The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
May. 26, 2005
Manish Sharma, Palo Alto, CA (US);
Manish Sharma, Palo Alto, CA (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
Provided is a sensor array and a method of forming the same. The sensor array includes an array of apertures etched into a 3D patterned resist layer to expose areas of one or more agents and/or reagents deposited on a substrate. The sensor is formed using a Self-Aligned Imprint Lithography ('SAIL') method, a process that allows for a one-time deposition of all required materials followed by a series of etching/cleaning steps. The location of reagents on the sensor template, as well as the concentration gradient of each reagent, may be controlled through the sensor manufacturing process. Bores of a single reagent, or bores containing two or more reagents, may be formed using the SAIL process.