The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Feb. 04, 2003
Applicants:
Gary J. Nabel, Washington, DC (US);
Bimal K. Chakrabarti, Gaithersburg, MD (US);
Yue Huang, Gaithersburg, MD (US);
Inventors:
Gary J. Nabel, Washington, DC (US);
Bimal K. Chakrabarti, Gaithersburg, MD (US);
Yue Huang, Gaithersburg, MD (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 39/21 (2006.01);
U.S. Cl.
CPC ...
Abstract
Modified HIV Env, Gag, Pol, or Nef DNA with improved ability to elicit antibody and CTL responses to HIV antigens have been identified as prototype immunogens for the treatment and prevention of HIV infections. Modifications to Env glycoprotein include deletions in the cleavage site, fusogenic domain, and spacing of heptad repeats 1 and 2 and different COOH-terminal deletions. Other modifications entail expression of Gag-Pol and Gag-Pol-Nef as fusion proteins.