The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Jun. 28, 2004
Kenichi Ishikawa, Chita-gun, JP;
Keizou Yokoi, Chita-gun, JP;
Kosuke Takeuchi, Chita-gun, JP;
Yutaka Kurita, Chita-gun, JP;
Heiji Uchiyama, Koto-ku, JP;
Kenichi Ishikawa, Chita-gun, JP;
Keizou Yokoi, Chita-gun, JP;
Kosuke Takeuchi, Chita-gun, JP;
Yutaka Kurita, Chita-gun, JP;
Heiji Uchiyama, Koto-ku, JP;
Nippon Chemical Industrial Co., Ltd., Tokyo, JP;
Abstract
High purity phosphoric acid having an Sb content of 200 ppb or less and a sulfide ion content of 200 ppb or less as impurity contents on a 85 weight percent HPObasis. The high purity phosphoric acid is useful as an etching solution for semiconductor devices having a silicon nitride film, an etching solution for liquid crystal display panels having an alumina film, a metallic aluminum etching solution, an alumina etching solution for ceramics, a raw material of phosphate glass for optical fiber, a food additive, and so forth. A metallic material having low capability of forming a lithium compound penetrates through the whole thickness of the active material layer